Regulated gas supply system

G - Physics – 05 – D

Patent

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Details

G05D 16/02 (2006.01) G05D 16/10 (2006.01)

Patent

CA 2584749

A regulated gas supply system having a body defining a pressurized gas reservoir connected to a high-pressure regulator that regulates the high pressure gas from the gas reservoir to disperse the gas at a desired pressure. The gas regulating assembly includes a piston chamber with a piston slidably positioned in the piston chamber, the piston chamber having a secondary chamber connected to the gas reservoir. A spring is positioned between one side of the piston and the piston chamber, with the piston including a piston channel to allow pressurized gas to flow through the piston. Pressure is developed on the piston opposite the spring that is proportional to the force of the spring, providing a balanced piston.

Un système régulé d'amenée de gaz comprend un corps qui définit un réservoir de gaz sous pression raccordé à un régulateur haute pression qui régule le gaz haute pression provenant du réservoir de gaz de manière à diffuser le gaz à une pression désirée. L'ensemble de régulation de gaz comprend une chambre de piston munie d'un piston disposé coulissant dans la chambre de piston, ladite chambre de piston possédant une chambre secondaire reliée au réservoir de gaz. Un ressort est ménagé entre un côté du piston et la chambre de piston, le piston comprenant un canal de piston qui permet au gaz sous pression de s'écouler via le piston. La pression est développée dans le piston du côté opposé du piston, et elle est proportionnelle à la force du ressort, de manière à former un piston équilibré.

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