Removal of co.sub.2 and/or h.sub.2s and/or cos from gases...

B - Operations – Transporting – 01 – D

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B01D 53/34 (2006.01) B01D 53/14 (2006.01)

Patent

CA 1090098

ABSTRACT OF THE DISCLOSURE: In a process for removing CO2 or H2S or both from gases which contain said constituents by washing the gases with an aqueous solution of a scrubbing liquid and subsequently regenerating the scrubbing liquid, the improvement which com- prises: using a scrubbing liquid which contains up to 0.8 mole/l of piperazine as an absorption accelerator and at least one solvent of the group of chemical solvents in an amount of 1.5 to 4.5 moles/l, wherein that chemical solvent is selected from the group consisting of aminocarboxylic acids, potassium hydroxide and alkanolamines. The washing process is used for natural gases, coke-oven gases, gases from the gasification of coal and synthesis gases, of any origin.

264022

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