Removing metal ions from wastewater

Details Removing metal ions from wastewater Removing metal ions from wastewater

C - Chemistry, Metallurgy

02

F

C02F 1/28 (2006.01) C02F 1/52 (2006.01) C02F 1/68 (2006.01) C02F 9/00 (2006.01)

Patent

CA 2332880

A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e.g., greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A chemical precipitation unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.

Nouveaux procédé et appareil destinés à nettoyer des eaux usées contenant des ions métalliques en solution, du peroxyde d'hydrogène et une haute teneur en matières solides, par ex. à raison de plus d'environ 50 mg/l de solides particulaires. Une colonne d'absorption sur charbon actif élimine le peroxyde d'hydrogène dans les eaux usées traitées à forte teneur en matières solides. Une unité de précipitation chimique enlève les ions métalliques de la solution. Ledit procédé permet l'élimination des ions métalliques tels que le cuivre d'une boue de polissage qui constitue un sous-produit à teneur élevée en matières solides provenant du polissage mécanico-chimique de microcircuits intégrés pour obtenir des eaux d'évacuation propres d'un point de vue environnemental.

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