C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
C08G 73/10 (2006.01) H01L 23/29 (2006.01)
Patent
CA 2050919
Abstract of the Invention The resins for protection of semiconductors of this invention comprise polyimides having repeating units of the general formulas (1), (2), and (3) at a specified ratio Image (1) Image (2) Image (3) wherein Ar is at least one radical selected from Image and radicals of the general formula Image - 2 5 - in which Z is a direct bond, -O-, or -SO2-, X is -O- or -C(CH3)2-, Y is a direct bond or at least one radical selected from -O-, -SO2-, -C(CH3)-, and -C(CF3)2-, R1 and R2 are alkyl groups, m is an integer from 0 to 4. R3 and R4 are divalent organic radicals, R5 to R8 are hydrocarbon radicals with 1 to 6 carbon atoms, and n is an integer from 1 to 5. - 2 6 -
Furukawa Nobuyuki
Kitamura Kenichi
Wada Yukihiro
Yamada Yasuharu
Furukawa Nobuyuki
Kitamura Kenichi
Nippon Steel Chemical Co. Ltd.
Robic
Wada Yukihiro
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