A - Human Necessities – 61 – K
Patent
A - Human Necessities
61
K
A61K 6/093 (2006.01) C07F 7/18 (2006.01) C08G 77/20 (2006.01) C08G 77/22 (2006.01)
Patent
CA 2120490
The invention relates to a self-curing, photochemically or thermally curable resinous dental composition based on polymerisable polysiloxanes, to a process for its preparation and to its use for the preparation of pasty, self-curing, photochemically or thermally curable dental materials. Said composition is obtainable by hydrolytic condensation of one or more hydrolytically condensable silicon compounds, 1 to 100 mol%, based on monomeric compounds, of silanes of the general formula Yn-SiXmR4-(n + m) and/or {XnRkSi[R2(A)1]4-(n + k)}x B being selected. The radicals A, X, Y, R2, R' and R are identical or different and have the following meaning: A = O, S, PR', POR', NHC(O)O or NHC(O)ONR',B = a straight-chain or branched organic radical which is derived from a compound B' having at least one (for 1 = 1 and A = NHC(O)O or NHC(O)NR') or at least two C=C double bonds and 5 to 50 carbon atoms, R = alkyl, alkenyl, aryl, alkylaryl or arylalkyl, R' = H, alkyl or aryl, R2 = alkylene, arylene or alkylenearylene, X = H, halogen, hydroxyl, alkoxy, acyloxy, alkylcarbonyl, alkoxycarbonyl or NR'2, Y = a substituent which contains a substituted or unsubstituted 1,4,6-trioxaspiro[4,4]nonane radical, n = 1, 2 or 3, m = 1, 2 or 3, where n + m < 4, k = 0, 1 or 2, 1 = 0 or 1, x = an integer whose value is stated in the description.
L'invention concerne une composition dentaire résineuse autopolymérisable, photodurcissable ou thermodurcissable à base de polysiloxanes polymérisables, un procédé de préparation de cette composition et son utilisation pour la préparation de produits dentaires pâteux, autopolymérisables, photodurcissables ou thermodurcissables. Ladite composition s'obtient par condensation hydrolytique d'un composé de silicium hydrolytiquement condensable ou plus, dans un pourcentage molaire de 1 à 100 %, par rapport aux composés monomériques, de silanes de formule générale Yn-SiXmR4-(n + m) et/ou {XnRkSi[R2(A)1]4-(n + k)}x B choisis. Les radicaux A, X, Y, R2, R' et R sont identiques ou différents et ont les significations suivantes : A = O, S, PR', POR', NHC(O)O ou NHC(O)ONR', B = un radical organique à chaîne linéaire ou ramifiée qui est dérivé d'un composé B' portant au moins une (pour 1 = 1 et A = NHC(O)O ou NHC(O)NR') ou au moins deux doubles liaisons C=C et de 5 à 50 atomes de carbone, R = alkyle, alkényle, aryle, alkylaryle ou arylalkyle, R' = H, alkyle ou aryle, R2 = alcénylène, arylène ou alcénylènearylène, X = H, halogène, hydroxyle, alcoxy, acyloxy, alkylcarbonyle, alcoxycarbonyle ou NR'2, Y = un substituant qui contient un radical 1,4,6-trioxaspiro[4,4]nonane substitué ou non substitué, n = 1, 2 ou 3, m = 1, 2 ou 3, où n + m < 4, k = 0, 1 ou 2, 1 = 0 ou 1, x = un nombre entier dont la valeur est précisée dans la description.
Storch Werner
Wolter Herbert
Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung
Kirby Eades Gale Baker
The Procter & Gamble Company
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