G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/022 (2006.01) G03F 7/09 (2006.01)
Patent
CA 2041434
- 28 - ABSTRACT OF THE DISCLOSURE A resist composition comprising an alkali-soluble resin, a 1,2-quinone diazide compound and a compound of the general formula (I): Image (I) wherein Z is an oxygen or sulfur atom or a group of the formula: >N-R4 in which R4 is a hydrogen atom or an alkyl group; R1, R2 and R3 are the same or different and inde- pendently a hydrogen atom, a substituted or unsubstituted alkyl group, a halogen atom, a hydroxyl group, a cyano group or a group of the formula: -OCOR" in which R" is a substituted or unsubstituted alkyl group; and X and Y are independently a cyano group or a group of the formula: Image , -COOR or -CONHR' in which R is an alkyl group and R' is a hydrogen atom or an aryl group, which is suitable for the formation of very fine patterns on a substrate having a high reflectance.
Hanawa Ryotaro
Hioki Takeshi
Kitao Teijiro
Matsuoka Masaru
Takagaki Hiroshi
Kirby Eades Gale Baker
Sumitomo Chemical Company Limited
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