Resist developer including quaternary ammonium or...

Details Resist developer including quaternary ammonium or... Resist developer including quaternary ammonium or...

G - Physics

03

F

96/269, 96/58

G03F 7/32 (2006.01)

Patent

CA 1176901

Abstract There are disclosed resist developers in which additives selected from certain tetraalkylammonium or phosphonium cations, benzyltrialkylammonium or phos- phonium cations, and benzyltriphenylammonium or phos- phonium cations, are effective in enhancing the developer selectively.

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