C - Chemistry – Metallurgy – 09 – D
Patent
C - Chemistry, Metallurgy
09
D
400/4206
C09D 11/10 (2006.01) H05K 3/18 (2006.01) H05K 3/00 (2006.01)
Patent
CA 1338252
A resist ink composition suitable for forming a masking pattern resistive against chemical attack by a chemical plating liquor is disclosed which comprises: a phenol novolak epoxy resin having an epoxy equivalent of 170-250; a phenol novolak resin having a softening point of 60- 130 °C; a montmorillonite organic complex such as bentonite ion-exchanged with an organic cation; a curing-accelerating catalyst; and an organic solvent.
604829
Akutagawa Ichiro
Fujii Ryuichi
Kawashima Masao
Kobayashi Tuyoshi
Ogitani Osamu
Sim & Mcburney
Somar Corporation
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