Resist material and process for forming fine resist pattern

Details Resist material and process for forming fine resist pattern Resist material and process for forming fine resist pattern

G - Physics

03

F

96/177, 402/257,

G03F 7/26 (2006.01) G03F 7/039 (2006.01)

Patent

CA 1207099

Abstract of the Disclosure A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula: Image wherein R1 is methyl group, ethyl group, a halogen- substituted methyl or ethyl group, a halogen atom or hydrogen atom, R2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and Rf is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an .alpha.-cyanoacrylate.

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