Resist material and process for use

Details Resist material and process for use Resist material and process for use

C - Chemistry, Metallurgy

07

D

C07D 309/12 (2006.01) C08F 24/00 (2006.01) G03F 7/039 (2006.01)

Patent

CA 2080365

2080365 9115810 PCTABS00007 Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester moieties in the presence of an acid generator activated by actinic radiation such as UV-visible, deep ultraviolet, e-beam and x-ray radiation.

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