Resist materials

Details Resist materials Resist materials

G - Physics

03

F

G03F 7/039 (2006.01) G03F 7/004 (2006.01)

Patent

CA 2126015

Photoacid generators advantageous for use in applications such as photoacid generators used in chemically amplified resists are disclosed. These compounds are based on an ortho nitro benzyl configuration employing an .alpha. substituent having high bulk, steric characteristics, and electron withdrawing ability. The enhanced efficacy is particularly found in compounds both having a suitable .alpha. substituent and a second ortho substituent with large electron withdrawing and steric effects.

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