Resistance heater for diamond production by cvd

C - Chemistry – Metallurgy – 30 – B

Patent

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32/23, 309/43, 1

C30B 29/04 (2006.01) C23C 16/27 (2006.01) C23C 16/44 (2006.01) C30B 25/02 (2006.01) C30B 25/10 (2006.01)

Patent

CA 1318225

RD-18,300 RESISTANCE HEATER FOR DIAMOND PRODUCTION BY CVD ABSTRACT A plural substrate CVD apparatus for diamond crystal production utilizes spaced apart vertical, parallel, planar substrate panels with an electrical (direct current, D.C.) resistance filament heater therebetween. A hydrogen-hydrocarbon gas mixture flows between panels to come into contact with the heater and the panels to cause diamond crystal nucleation and growth on the substrate panels. The apparatus includes means for maintaining the spaced relationship of the heater from the substrate surfaces, comprising a rod member attached to one end of the heater and tensioned by cable passing over a pulley member and attached to a weight.

602224

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