C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/233, 167/246
C07D 257/04 (2006.01) A61K 31/41 (2006.01) C07C 205/37 (2006.01)
Patent
CA 1247628
Novel resorcinol ethers Abstract Novel 4-acylresorcinol ethers of the formula Image (I) in which R1 represents lower alkyl, R2 represents lower alkyl, lower alkenyl or lower alkynyl, R3 represents hydrogen, lower alkoxy, trifluoromethyl or halogen, alk represents an alkylene radical, one of the radicals R4, R5 and R7 is a group of the formula -NH-C(=0)-R8, a radical R4 or R5 that is other than a group of the formula -NH-C(=O)-R8 is a radical R9 and a radical R7 that is other than a group of the formula -NH-C(=O)-R8 is a radical R10, R6 represents hydrogen, lower alkyl, halogen, trifluoromethyl, optionally esterified or amidated carboxy, cyano or lower alkanoyl, R8 represents optionally esterified or amidated carboxy, or 5-tetrazolyl, R9 represents hydrogen, lower alkyl, lower alkoxy, halogen or trifluoromethyl, and R10 - 2 - represents hydrogen, lower alkyl, lower alkoxy, halogen, trifluoromethyl, cyano or optionally esterified or amidated carboxy, and their salts have LTD4-antagonistic and PLA2-phospholipase-inhibiting properties. They can be manufactured according to methods known per se.
482023
Beck Andreas
Sallmann Alfred
Wenk Paul
Fetherstonhaugh & Co.
Novartis Ag
LandOfFree
Resorcinol ethers does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Resorcinol ethers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resorcinol ethers will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1330800