Resorcinol ethers

C - Chemistry – Metallurgy – 07 – D

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167/233, 167/246

C07D 257/04 (2006.01) A61K 31/41 (2006.01) C07C 205/37 (2006.01)

Patent

CA 1247628

Novel resorcinol ethers Abstract Novel 4-acylresorcinol ethers of the formula Image (I) in which R1 represents lower alkyl, R2 represents lower alkyl, lower alkenyl or lower alkynyl, R3 represents hydrogen, lower alkoxy, trifluoromethyl or halogen, alk represents an alkylene radical, one of the radicals R4, R5 and R7 is a group of the formula -NH-C(=0)-R8, a radical R4 or R5 that is other than a group of the formula -NH-C(=O)-R8 is a radical R9 and a radical R7 that is other than a group of the formula -NH-C(=O)-R8 is a radical R10, R6 represents hydrogen, lower alkyl, halogen, trifluoromethyl, optionally esterified or amidated carboxy, cyano or lower alkanoyl, R8 represents optionally esterified or amidated carboxy, or 5-tetrazolyl, R9 represents hydrogen, lower alkyl, lower alkoxy, halogen or trifluoromethyl, and R10 - 2 - represents hydrogen, lower alkyl, lower alkoxy, halogen, trifluoromethyl, cyano or optionally esterified or amidated carboxy, and their salts have LTD4-antagonistic and PLA2-phospholipase-inhibiting properties. They can be manufactured according to methods known per se.

482023

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