G - Physics – 03 – F
Patent
G - Physics
03
F
356/194
G03F 9/00 (2006.01) G03F 7/20 (2006.01)
Patent
CA 1297598
Abstract of the Disclosure A frame for a reticle or mask used in making integrated circuits, and capable of precisely positioning and holding a reticle in the X, Y and Z axis with a minimum of bending comprises a frame, and alignment device mounted on said frame for positioning the reticle along the Z-axis, and a further device for adjustably positioning the reticle along the Y-axis. A Y-axis transversly compliant axial loading spring's mounted on said frame opposite the Y-axis adjusting device. Also provided is an X-axis adjusting device, mounted on said frame for adjustably positioning the reticle along the X-axis, and an X-axis transversly compliant axial loading spring mounted on said frame opposite said X-axis adjusting device.
560505
Engelbrecht Orest
Laganza Joseph L.
Engelbrecht Orest
Laganza Joseph L.
Osler Hoskin & Harcourt Llp
Perkin-Elmer Corporation The
Svg Lithography Systems Inc.
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