C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/302.7
C07D 413/06 (2006.01) C07D 417/06 (2006.01)
Patent
CA 1264758
ABSTRACT Disclosed are a compound of the formula Image (1) wherein R1 is lower alkyl, A is a group of the formula Image Image (in which R3 is hydrogen or lower alkyl) or methylene, and R2 is hydrogen or a group of the formula -(CH2)nCOOH (in which n is an integer of 1 to 6) or a salt of the derivative, and preparation thereof. The compounds have an excellent aldose reductase inhibitory action.
499002
Honna Takaji
Ogawa Kazuo
Marks & Clerk
Taiho Pharmaceutical Company Limited
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