C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
204/29.5
C25D 3/52 (2006.01) C25D 3/50 (2006.01)
Patent
CA 1132939
ABSTRACT OF THE DISCLOSURE The disclosure describes an aqueous acidic rhodium plating bath comprising 0.1 to 30 g/l of rhodium ions, 0.1 to 20 g/l of a carboxylic acid containing at least one amino group, and 10 to 100 g/l of orthophosphate radicals. The bath has a pH of from 0.1 to 2Ø This bath is most suitable for flash deposits of rhodium of the order of 3 to 15 micro- inches thick. This bath reduces the drag out losses in such flash plating.
328747
Mcnichols Dorren K.
Stevens Peter
Oxy Metal Industries Corporation
Swabey Ogilvy Renault
LandOfFree
Rhodium plating does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Rhodium plating, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rhodium plating will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-975985