Rhodium plating

C - Chemistry – Metallurgy – 25 – D

Patent

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204/29.5

C25D 3/52 (2006.01) C25D 3/50 (2006.01)

Patent

CA 1132939

ABSTRACT OF THE DISCLOSURE The disclosure describes an aqueous acidic rhodium plating bath comprising 0.1 to 30 g/l of rhodium ions, 0.1 to 20 g/l of a carboxylic acid containing at least one amino group, and 10 to 100 g/l of orthophosphate radicals. The bath has a pH of from 0.1 to 2Ø This bath is most suitable for flash deposits of rhodium of the order of 3 to 15 micro- inches thick. This bath reduces the drag out losses in such flash plating.

328747

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