C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/202, 167/223
C07D 498/18 (2006.01) A61K 31/495 (2006.01) A61K 31/70 (2006.01) C07H 19/01 (2006.01)
Patent
CA 2032672
Rifamycin derivatives and processes for the manufacture thereof Abstract Described are novel acyl derivatives of rifamycins of the formula Image (I) and the salts thereof, in which the structural elements -A1-A2-, -A3-A4- and -A5-A6- each denote ethylene or vinylene or the elements -A1-A2- and -A3-A4- each denote ethylene and -A5-A6- denotes vinylene; X represents Image or Image and R6 denotes hydrogen or alkyl; alk denotes an aliphatic hydrocarbon radical; R1 denotes hydrogen or acyl; R2 denotes alkyl which is optionally substituted by an aromatic radical, and R3 and R3' represent a common bond, or R3 denotes hydrogen or acyl, and R3' is hydrogen; R4 denotes hydrogen, cycloalkyl or aryl; R5 denotes hydrogen or acetyl; and R7 denotes hydrogen or alkyl, and processes for their manufacture. Said derivatives have hypolipidaemic activity and can be used as medicaments.
Chen Jen
Francis John E.
Veenstra Siem J.
Ag Ciba-Geigy
Chen Jen
Fetherstonhaugh & Co.
Francis John E.
Veenstra Siem J.
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