C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
134/3.1
C11D 1/66 (2006.01) C08L 35/02 (2006.01) C11D 3/37 (2006.01)
Patent
CA 1287783
PATENT APPLICATION of JEAN DUPRE and ANDREA CLAUDETTE KEENAN for RINSE AID FORMULATION DN 85-50 MSA:vjc Abstract of the Invention A rinse aid formulation containing a low foam non- ionic surfactant, a low molecular weight poly(meth)acrylic acid and high molecular weight stabilizing polymer is provided. The stabilizing polymer, when at least about 85 percent neutralized, compatibilizes the low foam surfactant with the low molecular weight poly(meth)acrylic acid in water producing a stable, homogeneous aqueous dispersion. The neutralized low molecular weight poly(meth)acrylic acid improves wetting of the substrate by the rinse water and reduces spotting. The stabilizer and poly(meth)acrylic acid do not increase the foam or interfere with the defoaming properties of the surfactant.
535094
Dupre Jean
Keenan Andrea Claudette
Gowling Lafleur Henderson Llp
Rohm And Haas Company
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