C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 1/52 (2006.01) C07C 233/18 (2006.01) C11D 1/835 (2006.01) C11D 1/66 (2006.01) C11D 1/72 (2006.01)
Patent
CA 2167170
High-performance, solvent-free rinse aids for the machine cleaning of hard surfaces contain fatty acid-N- alkyl polyhydroxyalkyl amides corresponding to formula (I): Image (I) in which R1CO is an aliphatic acyl radical containing 6 to 22 carbon atoms, R2 is hydrogen, an alkyl or hydroxy- alkyl radical containing 1 to 4 carbon atoms and [Z] is a linear or branched polyhydroxyalkyl radical containing 3 to 10 carbon atoms and 3 to 10 hydroxyl groups, and optionally other nonionic surfactants and typical auxiliaries and additives.
L'invention concerne des liquides de rinçage très performants sans solvant qui sont destinés au nettoyage mécanique de surfaces dures et qui contiennent des acides gras-N-alkylpolyhydroxyalkylamides de la formule (I), dans laquelle R<1>CO désigne un reste acyle aliphatique ayant entre 6 et 22 atomes de carbone, R<2> désigne hydrogène, un reste alkyle ou un reste hydroxyalkyle ayant entre 1 et 4 atomes de carbone et Z désigne un reste polyhydroxyalkyle linéaire ou ramifié ayant entre 3 et 10 atomes de carbone et entre 3 et 10 groupes hydroxyle. Ces liquides de rinçage contiennent également éventuellement d'autres tensioactifs non ioniques et des adjuvants et des additifs classiques.
Burg Birgit
Fabry Bernd
Haer'er Juergen
Hees Udo
Jeschke Peter
Henkel Kommanditgesellschaft Auf Aktien
Norton Rose Or S.e.n.c.r.l. S.r.l./llp
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