C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 3/16 (2006.01) C11D 3/33 (2006.01) C11D 3/37 (2006.01)
Patent
CA 2138826
There is provided a rinse aid composition containing a chelant component selected from ethylenediamine disuccinic acid ethylenediamine diglutaric acid (EDDG), 2 hydroxypropylenediamine-disuccinic acid (HPDDS) or any of the salts or complexes of said chelant components. The pH of said composition as a 1% solution in distilled water at 20°C is preferably less than 7.
L'invention concerne une composition de rinçage contenant un constituant chélatant choisi parmi l'acide éthylènediamine-disuccinique, l'acide éthylènediamine-diglutarique (EDDG), l'acide 2-hydroxypropylènediamine-disuccinique (HPDDS) ou tout sel ou complexe desdits constituants chélatants. Le pH de ladite composition sous forme de solution à 1 % dans l'eau distillée à 20 degrés C est, de préférence, inférieur à 7.
Kirby Eades Gale Baker
The Procter & Gamble Company
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