Rotatable sputtering apparatus

Details Rotatable sputtering apparatus Rotatable sputtering apparatus

H - Electricity

01

J

204/167

H01J 37/317 (2006.01) C03C 21/00 (2006.01) C23C 14/34 (2006.01) H01J 37/34 (2006.01)

Patent

CA 1221335

ABSTRACT A magnetron cathode 11 for sputter-coating non-planar substrates S, which includes a rotatable elongated tubular member 16 having a layer of the coating material 20 to be sputtered applied to the outer surface thereof, and magnetic menas 55 mounted in said tubular member, said tubular member being contoured longitudinally to provide a non-cylindrical sputtering surface 17, 18, 19.

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