C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 14/35 (2006.01) C23C 14/34 (2006.01) H01J 37/34 (2006.01)
Patent
CA 2069328
2069328 9107521 PCTABS00005 Mechanisms for supporting, rotating, cooling and energizing a cylindrical magnetron target structure (59, 61) in a through supports (65, 69) at each end of the target structure. Two specific configurations are described. Particular arrangements (72) of magnets are provided within the target cylinder. Two adjacent rotating target cylinders may optionally be employed in order to increase the rate of depositing sputtered material on a substrate. The various features of this invention are particularly adapted for a large-scale cylindrical magnetron used for sputtering coatings on architectural glass panels, automobile windshields and the like, but are also advantageous for use in coating very small substrates.
Boozenny Alex
Hoog Josef T.
Gowling Lafleur Henderson Llp
The Boc Group Inc.
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