C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 403/12 (2006.01) A01N 43/54 (2006.01) A01N 43/66 (2006.01) A01N 43/84 (2006.01) A01N 57/24 (2006.01) C07D 239/60 (2006.01) C07D 251/16 (2006.01) C07D 251/30 (2006.01) C07D 401/12 (2006.01) C07D 413/12 (2006.01) C07D 417/12 (2006.01) C07F 9/6512 (2006.01)
Patent
CA 2075571
Salicylic acid derivatives and sulfur analogs thereof of the for- mula I, Image where R is halogen, alkyl, haloalkyl, alkoxy, haloalkoxy and/or alkylthio; n is 1, 2 or 3 or, in the case of halogen as substituents, 1, 2, 3, 4, or 5 R1 is a radical Image where m is 0 or 1 and R6 and R7 have the following meanings: hydrogen; alkyl, alkenyl or alkynyl, where these radicals are substituted or un- substituted; unsubstituted or substituted cycloalkyl; unsubstituted or substituted phenyl; or R6 together with R7 forms an unsubstituted C4-C7-alkylene chain in which a CH2 group may be replaced by oxygen, sulfur or -NH; or R1 is a group Image where R8 and R9 are each hydrogen, alkyl, alkenyl or alkynyl and 1 is 1, 2, 4 or 4; or a group -(CH2)1-S(=O)k-R10 where R10 is alkyl, alkenyl or alkynyl, 1 is 1, 2, 3 or 4 and k is 0, 1 or 2; or R1 is a radical -HN-SO2-R11, where R11 is alkyl or phenyl which in turn may carry from one to four of the following substituents: halogen, nitro, cyano or alkyl; a radical OR5, where R5 is an unsubstituted or substituted 5-membered aromatic heterocyclic structure which is bonded via a nitrogen atom and has from one to four nitrogen atoms in the ring or a radical Image where R10 and 1 have the abovementioned meanings, R2, and R3 are each alkyl, haloalkyl, alkoxy, haloalkoxy and/or alkyl- thio; R9 is hydrogen, halogen, nitro, alkyl, cyano or C1-C4-haloalkyl; X is oxygen or sulfur, and Z is nitrogen or the methine group.
Gerber Matthias
Meyer Norbert
Rheinheimer Joachim
Saupe Thomas
Vogelbacher Uwe Josef
Basf Aktiengesellschaft
Gerber Matthias
Meyer Norbert
Rheinheimer Joachim
Robic
LandOfFree
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