H - Electricity – 01 – L
Patent
H - Electricity
01
L
356/149, 356/75
H01L 29/76 (2006.01) H01L 29/10 (2006.01) H01L 29/423 (2006.01) H01L 29/812 (2006.01)
Patent
CA 1221474
Abstract of the Disclosure: A Schottky-gate field effect transistor comprises a semi-insulative semiconductor substrate, an active layer formed on one surface of the substrate, a source electrode and a drain electrode on the active layer in ohmic contact thereto, respectively, a first Schottky gate electrode on the active layer between the source and drain electrodes, and a second Schottky gate electrode on the active layer between the drain electrode and the first gate electrode. A portion of the active layer underneath the second gate electrode has a sheet resistance smaller than that of the active layer portion underneath the first gate electrode. The source electrode and the second gate electrode is electrically interconnected by connection means formed on the substrate. 22
489149
Bereskin & Parr
Sumitomo Electric Industries Ltd.
LandOfFree
Schottky-gate field effect transistor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Schottky-gate field effect transistor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Schottky-gate field effect transistor will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1204789