Second-harmonic generation in semiconductor heterostructures

G - Physics – 02 – F

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G02F 1/37 (2006.01) H01S 3/109 (2006.01) H01S 5/183 (2006.01) G02F 1/377 (2006.01) H01S 5/06 (2006.01) H01S 5/32 (2006.01)

Patent

CA 2128251

Second-Harmonic Generation in Semiconductor Heterostructures Abstract of the Disclosure Quasi-phase matched (QPM) second-harmonic (SH) generation in the reflection geometry is described. The SH intensity can be strongly enhanced by spatially modulating the optical properties of the nonlinear medium. This type of quasi-phase matching is demonstrated using an Al0.8Ga0.2As/GaAs heterostructure designed for .lambda.=1.06 µm incident light. The SH light intensity generated in reflection from the heterostructure is enhanced 70 times relative to the SH response of a homogeneous GaAs wafer. A Fabry-Perot resonant cavity design employs this structure to make thin films with extremely high SH generation efficiencies. This is of particular interest used in vertical cavity surface emitting lasers (VCSELs).

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