Selectable mechanical and electronic pattern generating...

F - Mech Eng,Light,Heat,Weapons – 21 – S

Patent

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240/91

F21S 8/00 (2006.01) F21S 10/00 (2006.01) F21V 9/10 (2006.01)

Patent

CA 2017337

Abstract of the Disclosure A lighting system aperture mechanism formed by a movable carriage including a frame with openings for mechanically formed or electronic pattern apertures. The frame is moved to position a selected opening around a beam of light and the pattern aperture disposed within the selected opening may be rotated as desired to produce special effect patterns in the beam of light.

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