Selective and continuous removal of metal-ion contaminants...

Details Selective and continuous removal of metal-ion contaminants... Selective and continuous removal of metal-ion contaminants...

C - Chemistry, Metallurgy

25

D

252/30, 204/31,

C25D 21/18 (2006.01) C23C 22/86 (2006.01) C23G 1/36 (2006.01)

Patent

CA 1249566

SELECTIVE AND CONTINUOUS REMOVAL OF METAL-ION CONTAMINANTS FROM PLATING BATHS ABSTRACT A method is disclosed for the selective removal of metal ions from plating solutions comprising contacting the plating solutions with liquid organic complexing agents such as oximes or phosphoric acid esters or microporous material, preferably anisotropic, the microporous material being impregnated with such substances. The microporous material may be in various forms, including beads, fibers, sheets and gels. Copper, zinc and iron contaminants are effectively removed from nickel-plating solutions.

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