G - Physics – 01 – B
Patent
G - Physics
01
B
G01B 11/06 (2006.01) G01B 11/26 (2006.01) G01N 21/21 (2006.01) G01N 21/41 (2006.01) G01N 21/43 (2006.01)
Patent
CA 2159831
An ellipsometric measuring system is set up in association with a vacuum chamber on a production line for thin film samples. The ellipsometer (8) has a scanner (12) for directing the incident light beam to different locations on a thin film sample (11), and the ellipsometer also has an aperture (13) for limiting the reflected light beam (27) received by the photodetector (36). The scanner implements a method of aligning the incident beam to a selected surface of the sample. The scanner and the aperture are used to provide a finer adjustment of the incident beam with respect to the selected surface. The ellipsometric measuring system further uses test thin film samples with known film thickness and index or refractions to calculate a value for the angle of incidence of the incident light beam.
De Bhola N.
Hsu Jon Shaochung
Robison Rodney L.
Yasar Tugrul
Macrae & Co.
Tokyo Electron Limited
LandOfFree
Self aligning in-situ ellipsometer and method of using for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Self aligning in-situ ellipsometer and method of using for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Self aligning in-situ ellipsometer and method of using for... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1457872