Self-aligning mask

Details Self-aligning mask Self-aligning mask

H - Electricity

01

L

356/177

H01L 21/02 (2006.01) G03F 7/20 (2006.01) H05K 3/24 (2006.01)

Patent

CA 1196112

SELF-ALIGNING MASK ABSTRACT OF THE DISCLOSURE A process for forming a self aligned resist mask over a surface of an alumina ceramic substrate having a conductive molybdenum pattern at said surface by first blanket coating the surface with a negative resist sensitive to aluminum emitting X-rays. A blanket dosing of the substrate with resist insensi- tive X-rays occurs to induce X-ray emission by the aluminum of said substrate to penetrate said resist. The aluminum X-ray emission is screened by said molybdenum pattern at the surface and the resist adjacent the surface molybdenum pattern is penetrated by the aluminum X-ray emission. The resist is devel- oped for removal thereof over the molybdenum pattern while retaining the resist doped by said aluminum X-ray emission. Further metalization can be accom- plished by evaporation or sputtering to blanket coat the developed resist with a conductive metal followed by removal of the resist with the metal coating thereon such that the metal coating is retained on the molybdenum pattern.

438412

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