C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
C25D 3/30 (2006.01) C23C 18/31 (2006.01)
Patent
CA 2152655
Acidic electrolyte for dip-tin-plating aluminum alloys, containing tin salts, surfactants and additives yielding halogen ions, fluorine complexes, having the optimum effective halogen content that corresponds to its maximum solubility, being added as additives yielding halogen ions.
Guhl Dieter
Honselmann Frank
Goldschmidt Ag
Marks & Clerk
LandOfFree
Self-regulating, acidic electrolytes for dip-tin-plating... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Self-regulating, acidic electrolytes for dip-tin-plating..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Self-regulating, acidic electrolytes for dip-tin-plating... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1621559