C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 14/35 (2006.01) C22C 18/00 (2006.01) C23C 14/34 (2006.01)
Patent
CA 2103241
Alloys useful for preparing self-supporting cylindrical targets are provided. The alloys comprise zinc and other metals consisting of one or more of the following: aluminum, bismuth, cerium, gadolinium, hafnium, niobium, silicon, tantalum, titanium, vanadium, yttrium, and zirconium. In one preferred embodiment, a zinc alloy with approximately 2o aluminum forms self-supporting cylindrical target from which metal oxide films are prepared by reactive sputtering. The alloy oxide films are clear, transparent, non-absorbing, and optically functional.
L'invention concerne des alliages utiles pour préparer des cibles cylindriques autoportantes. Les alliages comprennent du zinc et d'autres métaux tels que l'aluminium, le bismuth, le cérium, le gadolinium, l'hafnium, le niobium, le silicium, le tantal, le titane, le vanadium, l'yttrium et le zirconium. Dans un mode préféré de réalisation, un alliage de zinc ayant approximativement 2 % d'aluminium forme des cibles cylindriques autoportantes à partir desquelles des films en oxyde métallique sont préparés par pulvérisation réactive. Les films d'oxyde métallique sont clairs, transparents, non absorbants et optiquement fonctionnels.
Hillendahl James W.
Palmer J. Glen
Gowling Lafleur Henderson Llp
The Boc Group Inc.
LandOfFree
Self-supporting zinc alloy rotating sputter target does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Self-supporting zinc alloy rotating sputter target, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Self-supporting zinc alloy rotating sputter target will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-2086933