C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/211, 260/251
C07D 401/12 (2006.01) C07D 203/26 (2006.01) C07D 211/70 (2006.01) C07D 211/98 (2006.01) C07D 213/75 (2006.01) C07D 213/77 (2006.01) C07D 213/89 (2006.01) C07D 237/04 (2006.01) C07D 239/42 (2006.01) C07D 295/28 (2006.01) C07D 405/12 (2006.01) C07D 413/12 (2006.01) C07D 417/12 (2006.01)
Patent
CA 1256434
ABSTRACT OF THE DISCLOSURE A compound of the formula : Image wherein R1 is hydrogen, R2 is hydrogen, lower alkyl, ar(lower)alkyl, lower alkenyl or aryl, R3 is lower alkyl, artlower)alkyl, lower alkenyl or aryl, or R2 and R3 are taken together to form (C2-C6)- alkylidene group optionally substituted with aryl or taken together with the attached nitrogen atom to form a saturated or unsaturated, 5- or 6-membered heterocyclic group optionally substituted with aryl or lower alkyl; or R1 and R2 are taken together with the attached nitrogen atoms to form a saturated or unsaturated, 5- or 6-mernbered heterocyclic group or 1,2-diazaspiroalkane- 1,2-diyl group, R3 is hydrogen, lower alkyl, ar(lower)alkyl, lower alkenyl or aryl; R4 is lower alkyl optionally substituted with di(lower)alkylamino or a heterocyclic group, or a heterocyclic group optionally having suitable substituent(s), R5 is hydrogen or lower alkyl, and X is O or S, and a pharmaceutically acceptable salt thereof may be used as anti-inflamrnatory and analgesic agents.
484619
Hashimoto Masashi
Kawai Yoshio
Nakaguti Osamu
Nakatuka Michie
Shimazaki Norihiko
Fujisawa Pharmaceutical Co. Ltd.
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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