H - Electricity – 01 – L
Patent
H - Electricity
01
L
356/136
H01L 23/48 (2006.01) H01L 23/29 (2006.01) H01L 23/31 (2006.01) H01L 23/52 (2006.01) H01L 23/532 (2006.01) H01L 29/49 (2006.01)
Patent
CA 1204222
- 1 - Abstract: A semiconductor device has an electrode or inter- connection made of an insulating film, a tungsten film and a phosphosilicate glass film which are stacked and formed on a semiconductor substrate. In this manner the channeling attributed to the punch-through of ions during ion implantation, and fluctuations in threshold voltage can be effectively prevented and the device given stable characteristics.
438426
Iwata Seiichi
Kobayashi Nobuyoshi
Yamamoto Naoki
Hitachi Ltd.
Kirby Eades Gale Baker
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