H - Electricity – 01 – L
Patent
H - Electricity
01
L
356/162
H01L 23/48 (2006.01) H01L 21/285 (2006.01) H01L 23/52 (2006.01) H01L 23/528 (2006.01) H01L 23/532 (2006.01)
Patent
CA 1220561
-1- Abstract: A semiconductor device avoids defects caused by recrystallization in prior art devices. The surface of an insulator on which a material is to be recrystallized is flattened. A semiconductor layer employed for another use, for example as an interconnection between elements or as the gate electrode of a MOS transistor is disposed in the insulator. By virtue of the flattened insulator, the occurrence of crystal defects during recrystallization of the material is prevented.
460557
Miyao Masanobu
Ohkura Makoto
Warabisako Terunori
Hitachi Ltd.
Kirby Eades Gale Baker
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