Semiconductor etching apparatus with magnetic array and...

H - Electricity – 01 – J

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356/192

H01J 37/32 (2006.01)

Patent

CA 1255815

-10- Abstract of the Disclosure Semiconductor Etching Apparatus With Magnetic Array And Vertical Shield In an apparatus for etching a large semiconductor wafer the etch rate and uniformity of etching at the edges is improved by using an array of magnets behind the collector plate to form a double ring of plasma and using a grounded shield ring with perforations to pass gases. The shield ring extends both above and below the surface of the wafer being etched.

518419

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor etching apparatus with magnetic array and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor etching apparatus with magnetic array and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor etching apparatus with magnetic array and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1194044

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.