H - Electricity – 01 – J
Patent
H - Electricity
01
J
356/192
H01J 37/32 (2006.01)
Patent
CA 1255815
-10- Abstract of the Disclosure Semiconductor Etching Apparatus With Magnetic Array And Vertical Shield In an apparatus for etching a large semiconductor wafer the etch rate and uniformity of etching at the edges is improved by using an array of magnets behind the collector plate to form a double ring of plasma and using a grounded shield ring with perforations to pass gases. The shield ring extends both above and below the surface of the wafer being etched.
518419
Chow Robert
Downey Steve D.
Novellus Systems Inc.
R. William Wray & Associates
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