Semiconductor film and process for its production

Details Semiconductor film and process for its production Semiconductor film and process for its production

H - Electricity

01

L

356/182

H01L 21/363 (2006.01) C23C 14/58 (2006.01) C23C 16/56 (2006.01) H01L 21/203 (2006.01) H01L 21/205 (2006.01) H01L 21/30 (2006.01) H01L 31/20 (2006.01) C23C 14/06 (2006.01)

Patent

CA 2019923

Abstract of the Disclosure A method for forming an amorphous semiconductor film, which comprises (a) a film-forming step of forming a semiconductor film having not more than 20 atomic percent of bound hydrogen to a thickness of 3 to 1000 .ANG., and (b) a modifying step of modifying the formed film, the steps being repeated multiple times.

Affiliated with

Also associated with

Rating

Semiconductor film and process for its production does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor film and process for its production, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor film and process for its production will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1413207