Semiconductor laser having an algainp cladding layer

H - Electricity – 01 – S

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H01S 5/343 (2006.01) H01S 5/223 (2006.01) H01S 5/22 (2006.01) H01S 5/32 (2006.01) H01S 3/18 (1995.01)

Patent

CA 2112319

ABSTRACT OF THE DISCLOSURE A semiconductor laser includes a GaAs substrate, an active layer made of a semiconductor material having a band gap energy smaller than that of GaAs, and a top clad having an AlGaInP cladding layer. An index antiguiding type semiconductor laser is constituted based on the above structure. A top clad includes a base layer formed on the active layer and a protrusion strip for current injection protruding from the base layer and having an AlGaInP cladding layer. An AlGaInP light diffusion layer with an Al proportion smaller than that of the AlGaInP cladding layer and inclusive of zero, is formed on the base layer adjacent to the protrusion strip. The base layer has such a thickness as allows laser oscillation light to leak out to the light diffusion layer. - 21 -

Laser à semiconducteurs composé d'un substrat au GaAs, d'une couche active composée d'un matériau semiconducteur dont la largeur de bande interdite est inférieure à celle du GaAs et d'une couche supérieure plaquée d'AlGaInP. Un laser à semiconducteurs à structure d'indice antiguidage est réalisé avec la structure ci-dessus. Un revêtement plaqué supérieur comporte une couche de base formée sur la couche active et une bande en saillie qui dépasse de la couche de base en vue de l'injection de courant. Cette bande est recouverte d'une couche plaquée d'AlGaInP. Une couche d'AlGaInP diffusant la lumière et dont la teneur en Al est inférieure à celle de la couche plaquée d'AlGaInP ou même nulle est formée sur la couche de base adjacente à la bande en saillie. L'épaisseur de la couche de base permet à la lumière d'oscillation laser de s'échapper vers la couche diffusant la lumière.

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