Semiconductor mesa structure with flared groove

Details Semiconductor mesa structure with flared groove Semiconductor mesa structure with flared groove

H - Electricity

01

L

356/177, 345/32

H01L 33/00 (2006.01) H01S 5/227 (2006.01)

Patent

CA 1261483

6990D/D55C/ELGD - ABSTRACT - A semiconductor structure and methods for making it, for use in opto-electronic devices, employs only MOVPE growth steps. The structure is based on a mesa having substantially non-reentrant sides. To make it, an initial semiconductor structure is produced which comprises a substrate with a mesa thereon, the mesa having a self-aligned, central stripe 16 of metal organic vapour phase growth suppressing material on its uppermost surface 15. Burying layers 8, 9 are then grown by MOVPE an either side of the mesa, the stripe removed, and covering layers 10, 11 grown over the mesa and adjoining regions of the burying layers 8, 9. To make an opto-electronic device, a silica window 18 can be formed on the uppermost surface 20 of the covering layers 10, 11 and contacts 13, 14, 19 provided through the window 18 and to the remote face of the substrate. Two methods of making the initial semiconductor structure are described. Devices such as optical detectors and waveguides can be made using methods according to the invention. Particularly importantly, semiconductor lasers which will operate in a single transverse mode can be made.

512935

Affiliated with

Also associated with

Rating

Semiconductor mesa structure with flared groove does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor mesa structure with flared groove, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor mesa structure with flared groove will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1306218