Semiconductor wafer alignment marks for use with electron beams

Details Semiconductor wafer alignment marks for use with electron beams Semiconductor wafer alignment marks for use with electron beams

H - Electricity

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H01L 21/306 (2006.01) C03C 15/00 (2006.01) H01J 37/304 (2006.01) H01L 21/00 (2006.01) H01L 23/544 (2006.01)

Patent

CA 1063255

ABSTRACT OF THE DISCLOSURE An apparatus and process is disclosed for the adjustment of a semi- conductor wafer by electron beam illumination. An adjustment mark is provid- ed in a semiconductor wafer having a first layer thereon. The mark is formed as a recess which extends through an aperture in the first layer and into the semiconductor wafer. The width of the recess is not greater than its depth. An electron sensitive lacquer layer is provided on the first layer and in a bottom of the recess.

252026

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