Sensitivity photoresist compositions

Details Sensitivity photoresist compositions Sensitivity photoresist compositions

G - Physics

03

F

G03F 7/038 (2006.01) G03F 7/085 (2006.01) H05K 3/06 (2006.01)

Patent

CA 2139206

The invention disclosed is aqueous developable photoresist compositions that have increased photosensitivity by the inclusion in said compositions of a particular type of thioether oligomer.

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