Sensitization of photopolymerizable compositions

Details Sensitization of photopolymerizable compositions Sensitization of photopolymerizable compositions

C - Chemistry, Metallurgy

08

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C08L 101/00 (2006.01) C08F 2/50 (2006.01) C08L 57/00 (2006.01) C09D 5/32 (2006.01) C09D 157/00 (2006.01) C09D 201/00 (2006.01) G03F 7/029 (2006.01)

Patent

CA 2070354

ABSTRACT Photopolymerizable compositions containing free- radically polymerizable monomer, diaryl iodonium or triaryl sulfonium complex salts, and certain 1,3,5- tri(monoaryl)-2-pyrazolines. In dual-curable systems, epoxides are also polymerized. The inventive photopolymerizable compositions exhibit high photosensitivities and are relatively unaffected by the presence of oxygen.

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