C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
96/155, 260/306.
C07D 405/04 (2006.01) C07D 209/82 (2006.01) C07D 311/02 (2006.01)
Patent
CA 1050029
SENSITIZER FOR USE IN ELECTROPHOTO- GRAPHIC LIGHT-SENSITIVE MATERIAL ABSTRACT OF THE DISCLOSURE A sensitizer for use in an electrophotographic light- sensitive material containing an organic photoconductor com- prising a pyrylium salt containing a carbazole nucleus repre- sented by the following general formula (I); Image (I) wherein R1 represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, a haloalky1 group having 1 to 5 carbon atoms a cyanoalkyl group having from 2 to 6 carbon atoms, a hydroxyalkyl group having 1 to 5 carbon atoms, or an acyl group; R2 represents a hydrogen atom, a halogen atom or a nitro group, R3 represents Image ; R4 represents a hydrogen atom or a hydroxy group; or R3 and R4 when taken together form a subs- tituted or unsubstituted benzene or naphthalene ring, said substituents being an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a nitro group or a halogen atom; -1- R5 represents a hydrogen atom or Image ; R6 represents a hydrogen atom, a halogen atom, an amino group, an alkylamino group having from 1 to 4 carbon atoms or an alkyl group having 1 to 5 carbon atoms; X represents Cl-, Br-, I-, ClO4-, NO3-, HSO4- orBF4-.
218259
Ono Hisatake
Seoka Yoshio
Watarai Syu
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