C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
402/1, 96/150, 4
C07C 69/00 (2006.01) C07C 49/747 (2006.01) C07C 49/82 (2006.01) C07C 49/83 (2006.01) C07C 49/84 (2006.01) C07D 295/108 (2006.01) C07D 303/32 (2006.01) C07D 311/22 (2006.01) C07D 333/22 (2006.01) C08F 2/50 (2006.01) C08K 5/07 (2006.01) G03F 7/031 (2006.01)
Patent
CA 1234242
SENSITIZERS FOR PHOTOPOLYMERISATION Abstract of the Disclosure Aromatic-aliphatic kittens of the formulae I, II, III or IV Image I III IV wherein n is 1 or 2, Ar is an aryl radical, R1 and R2 are monovalent aliphatic, cycloaliphatic or araliphatic radi- cals, R3 is a direct bond or a divalent organic radical, X is a hydroxyl or amino group or the monovalent etherifi- cation or silylation products thereof, and X' is a divalent amino, ether or silyloxy group, Y is a direct bond or CH2 and Z is O, S, SO2, CH2 or C(CH3)2, are suitable sensitizers for the photopolymerisation of unsaturated compounds and for the photochemical crosslinking of polyolefins. Some of these compounds are novel and can be obtained by methods analogous to those for obtaining the known compounds of this type.
318328
Felder Louis
Husler Rinaldo
Kirchmayr Rudolf
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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