Sensor formed on silicon on insulator structure and having...

G - Physics – 01 – L

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G01L 9/06 (2006.01) G01L 9/00 (2006.01)

Patent

CA 2470792

A semiconductor structure includes an upper and a lower layer of semiconductor material separated by a layer of insulation material. Resistors formed in the upper layer are connected into a Wheatstone bridge arrangement having an output. A first voltage provides power to the bridge. A second voltage connected to the lower layer of semiconductor material has a value selected to reduce the drift of the output following power up of the sensor.

L'invention a trait à une structure à semi-conducteur, qui comprend une couche supérieure et une couche inférieure de matière semi-conductrice, séparées par une couche de matière isolante. Des résistances formées dans la couche supérieure sont reliées de manière à constituer un agencement de type pont de Wheatstone possédant une sortie. Une première tension alimente le pont en énergie électrique. Une seconde tension, reliée à la couche inférieure de matière semi-conductrice, possède une valeur sélectionnée de manière à réduire la dérive de la sortie après la mise sous tension du capteur.

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