H - Electricity – 01 – L
Patent
H - Electricity
01
L
345/22
H01L 31/18 (2006.01) H01L 31/04 (2006.01)
Patent
CA 1150807
Abstract of the Disclosure The disclosure teaches a method of applying an electrical contact and an anodic antireflection coating to an n+ layer of a direct gap semiconductor device. In accordance with the invention, a metal contact is applied to the n+ type layer. The metal contact must be anodizable, Thereafter, the n+ layer is anodized whereby its thickness is reduced and an antireflection layer is formed thereover. The anodiz- able metal may comprise tin.
408201
Bozler Carl O.
Chapman Ralph L.
Fan John C. C.
Mcclelland Robert W.
Massachusetts Institute Of Technology
Swabey Ogilvy Renault
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