C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
260/230.58
C07H 5/06 (2006.01) C07H 15/20 (2006.01) C07H 15/203 (2006.01)
Patent
CA 2003984
ABSTRACT Sialic acid derivative with active ester groups expressed with the formula [I] Image [ I ] Where R1 denotes hydrogen or acetyl group, R2 hydrogen or lower alkyl group, R3 C2H4, C3H6 or C2H2, R4 hydroxyl group, residue left after removing hydrogen from the alcohol portion of active ester or alkyloxycarbonyloxy group, Ac acetyl group, Ph phenyl group, X oxygen or sulfur. This sialic acid derivative has high reactivity because it has active ester groups in molecules and can be used as raw material or intermediate for synthesis of various sialic acid derivatives.
Tanaka Makoto
Yoshimura Shoji
Mect Corporation
Ridout & Maybee Llp
Tanaka Makoto
Yoshimura Shoji
LandOfFree
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