C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
260/230.58
C07H 15/203 (2006.01)
Patent
CA 1262131
ABSTRACT OF THE DISCLOSURE The invention is concerned with new compounds of the formula: Image wherein R1 is hydrogen, R2 is hydrogen or acetyl, or R1 and R2 together form phthaloyl, R3, R4, R5 and R6 are hydrogen or acetyl, or R4 and R5 together form isopropylidene, or R5 and R6 together form isopropylidene and Bn is benzyl. These new compounds are useful as an intermediate in the synthesis of sialoylglycoconjugate, recognition marker on the cell surface, and antagonists.
555845
Kitajima Toru
Nukada Tomoo
Ogawa Tomoya
Shitori Yoshiyasu
Sugimoto Mamoru
Kitajima Toru
Mect Corporation
Nukada Tomoo
Ogawa Tomoya
Shitori Yoshiyasu
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