C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
260/306, 260/316
C07F 7/10 (2006.01)
Patent
CA 1146560
Abstract The compounds according to the invention have the formula I Image (I) in which R1, R2 and R3 are monovalent organic radicals or chlorine and Y and A are each a divalent organic grouping. These products are to be used as adhesion promoters, especially between inorganic solids and organic resins.
401795
Lohmann Dieter
Wyler Siegfried
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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