C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
204/91.15, 260/2
C07F 7/10 (2006.01) C07F 7/12 (2006.01) C07F 7/18 (2006.01) C09J 4/00 (2006.01)
Patent
CA 1140134
3-12001/ZF0/+/A Silanes containing imide groups Abstract The compounds according to the invention have the formula I Image (I) in which R1, R2 and R3 are monovalent organic radicals or chlorine and Z is a tetravalent organic radical and A is a divalent organic grouping. These products are to be used as adhesion promoters, especially between inorganic solids and organic resins. 4 processes of preparation are given.
334572
Lohmann Dieter
Wyler Siegfried
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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