C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 7/08 (2006.01) C07F 7/12 (2006.01) C07F 7/18 (2006.01) C12Q 1/68 (2006.01) G01N 21/17 (2006.01) G01N 33/531 (2006.01) G01N 33/544 (2006.01) G02B 6/10 (2006.01)
Patent
CA 2133946
The present invention is concerned with novel silanes and their application for the silanization of dielectric materials for anchoring biologically active compounds. The silanes have the general formula I (R1R2R3)Si-Y-X wherein R1, R2 and R3 signify alkyl, alkoxy or halogen, but at least one of these groups is alkoxy or halogen, Y signifies an alkylene chain [-CH2-(CH2)n-CH2-], a fluoroalkylene chain [-CH2-(CF2)n-CH2-], (-CH2-(CF2)n-CF2-] with n = 1-20 or an oligooxyalkylene chain -[(CH2)n'-O-(CH2)n"]m- with n', n" = 2-6 and m = 2-6 and X signifies an epoxide, an anhydride of a dicarboxylic acid with 4-5 C atoms, an isothiocyanate, an aryl carboxylic acid chloride or an aryl sulphonic acid chloride, provided that at least one of R1, R2 and R3 is halogen when X signifies an epoxide. The new silanes according to the invention offer the following advantages: The reactive groups X of the silanes are hydrolysis-stable but sufficiently reactive for the immobilization of an organic or biological recognition molecule to take place without further activation of the silane layer. The silanes are suitable for the direct coating of dielectric materials, in particular of dielectric waveguides which are preferably made of ZrO2, HfO2, Ta2O5, SiO2, Al2O3 or TiO2. The silanes can be applied to the surface of dielectric materials not only from solution, but also from the gas phase. The hydrolysis stability of the reactive groups gives rise to better stability during storage of silane layers and permits their direct application in an aqueous medium.
Barner Richard
Huber Walter
Hubscher Josef
Hurst Jurg
Schlatter Daniel
F. Hoffmann-La Roche Ag
Gowling Lafleur Henderson Llp
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